In-situ study of the preferential orientation of magnetron sputtered Ni-Ti thin films as a function of bias and substrate type
No abstract available.
URL: https://publications.hereon.de/id/27065/
Authors:Martins, R.M.S., Schell, N., Beckers, M., Muecklich, A., Reuther, H., Silva, R.J.C., Mahesh, K.K., Braz Fernandes, F.M.
Year:2008
In: SMST-2006, Proceedings of the International Conference on Shape Memory and Superelastic Technologies
Location:Pacific Grove, CA (USA)
Date:07.-11.05.2006
Pages:363 - 372
Publisher:ASM International, Ohio
Type:Confpaper
ISBN: 978-0-87170-862-5
Cite as: Martins, R.M.S.; Schell, N.; Beckers, M.; Muecklich, A.; Reuther, H.; Silva, R.J.C.; Mahesh, K.K.; Braz Fernandes, F.M.: In-situ study of the preferential orientation of magnetron sputtered Ni-Ti thin films as a function of bias and substrate type. In: Berg, B.; Mitchell, M.R.; Proft, J. (Eds.): SMST-2006, Proceedings of the International Conference on Shape Memory and Superelastic Technologies. Pacific Grove, CA (USA), 07.-11.05.2006, Ohio: ASM International, 2008. 363 - 372. (ISBN: 978-0-87170-862-5)
