TXRF Layer Analysis for Advanced Micro-Electronic Applications: Two Case Studies- HfO2 on Si and Si on Ge
No abstract available.
URL: https://publications.hereon.de/id/23504/
Authors:Hellin, D., Rip, J., Delabie, A., Bonzom, R., Beaven, P., De Gendt, S., Vinckier, C.
Year:2005
In: International Conference on Total Reflection X-Ray Fluorescence and Related Methods, TXRF 2005
Location:Budapest (H)
Date:18.-22.09.2005
Cite as: Hellin, D.; Rip, J.; Delabie, A.; Bonzom, R.; Beaven, P.; De Gendt, S.; Vinckier, C.: TXRF Layer Analysis for Advanced Micro-Electronic Applications: Two Case Studies- HfO2 on Si and Si on Ge. In: International Conference on Total Reflection X-Ray Fluorescence and Related Methods, TXRF 2005. Budapest (H), 18.-22.09.2005, 2005.
