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SR-TXRF Analysis of Contamination on Wafer Surfaces - Energy-dispersive vs. Wavelength-dispersive Systems
No abstract available.
URL:
https://publications.hereon.de/id/21906/
Authors:
Beaven, P., Schwenke, H., Knoth, J.
Year:
2002
In:
Hamburg Workshop "Application of Synchrotron Radiation in Chemistry-Status and Future"
Location:
Hamburg (D)
Date:
16.-17.09.2002
Cite as:
Beaven, P.; Schwenke, H.; Knoth, J.: SR-TXRF Analysis of Contamination on Wafer Surfaces - Energy-dispersive vs. Wavelength-dispersive Systems. In: Hamburg Workshop "Application of Synchrotron Radiation in Chemistry-Status and Future". Hamburg (D), 16.-17.09.2002, 2002.
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