Application of total reflection X-ray fluorescence analysis for metallic trace impurities on silicon wafer surfaces

book part

No abstract available.

URL: https://publications.hereon.de/id/17762/
Authors:Eichinger, P.,Rath, H. J.,Schwenke, H.
Year:1989
In: ASTM Special Technical Publicaton
Volume:990
Pages:305-313
Publisher:ASTM, Philadelphia
Type:book part
Cite as: Eichinger, P.; Rath, H.; Schwenke, H.: Application of total reflection X-ray fluorescence analysis for metallic trace impurities on silicon wafer surfaces. In: ASTM Special Technical Publicaton. Philadelphia: ASTM. 1989. 305-313.